Development of a coaxial type vacuum arc evaporation source

We have developed a new type vacuum are evaporation source which can be operated under the ultra high vacuum (<10/sup -6/ Pa) conditions. Coaxial arrangement of the anode and cathode preferentially collects only particles of small size (atomic ions) to deposit fine films. By pulse mode operation of the source with deposition rate of 0.1 nm/pulse, deposition of the ultra thin film layer can be easily controlled precisely. Based on these features this arc evaporation source is quite suitable for the production of thin films of nm range. We report some film deposition data along with the principle of the source and basic characteristic of arc discharge.