A history-mainly about ion implantation equipment since 1984

Since 1984 ion implantation processes have extended up to several megavolts and down to energies lower than one kilovolt. Implantation processes have also required parallel beams and wafers that could be tilted and repositioned or rotated in the beam. The physics is not new but considerable ingenuity has been exerted to meet all these requirements. Among the many implanters built during this time those with significant novel ideas are described. The geneaology of most of the major companies is traced with data about the growth of the industry.