Diffused resistor mismatch modeling and characterization

This paper presents a novel, physically based model and method for the characterization of diffused resistor mismatch. It is shown that the mismatch does not follow the 1/(/spl radic/(LW)) dependence as reported in other publications. We also demonstrate that there is an optimum sheet resistance for resistor mismatch as determined by a trade-off between the ion implant dose concentration and the junction depth mismatch.