Effects of deposition temperature and thermal annealing on the structural properties of titanium dioxide thin films prepared by mist chemical vapor deposition

Titanium dioxide thin films have been widely investigated as sensing material in various thin-film gas sensors. In this research, pure anatase TiO₂ thin films were fabricated with a novel mist chemical vapor deposition (mist CVD) method. The effects of deposition temperature and thermal annealing on the structural properties of TiO₂ thin films were investigated. It was found that the crystallinity of TiO₂ film was improved with the deposition temperature increase, the obtained TiO₂ film were kept anatase structure after annealing at the temperature of 800 °C.