Compact installation for radiation processing of materials by accelerated electrons

The installation has been designed for processing of articles and materials with the electron beam. The beam is generated by the sealed-off electron gun of unique design and is extracted to the irradiation area through thin Ti foil with 20/spl times/10 cm/sup 2/ area. The electron energy is up to 200 keV, pulse beam current -7 A. The processing is performed in nitrogen. Maximum pulse dose rate is 5/spl times/10/sup 4/ kGy/sec. The installation has compact high-voltage power supply, self-contained water cooling, and handy control with the beam parameters regulation within broad ranges. All the installation except the computer is packaged in one case with 2/spl times/0.7/spl times/0.7 m/sup 3/ dimensions. The installation has its own radiation shielding and is safe to use: the radiation dose at any place outside the case is near the background radiation level.