Generation of quasi-stationary broad pulsed electron beam by the forevacuum plasma source based on the arc discharge

The paper describes results of development and investigation processes of pulsed electron beam generation by a plasma electron source in the fore-vacuum pressure range (3-20 Pa). The plasma electron source is based on the cathodic arc discharge. The quasi-stationary pulse length range for electron beam generation is attractive due to possibility of single pulse electron beam technology. One of the main advantages for the fore-vacuum plasma electron sources is its ability for direct treatment dielectric substrates, like ceramics and polymers. Characteristics of the quasi-stationary (1.8 ms) electron beam source based on the arc discharge and research of an electron beam formation in the fore-vacuum pressure range are presented and discussed.