Depth dependence of modified bond on surface processed PTFE using high E/n discharge

The authors have studied on collision process in the discharge under high E/n conditions. From the results, it was deduced that many activated species are generated in the discharge. Using the discharge, surface processing of PTFE (Poly-Tetra-Fluoro-Ethylene) was carried out. As the result, a surface wettability was increased. During the processing, the sample on the cathode was irradiated by ions with kinetic energy. It is considered that these ions may implant into the surface. The range of ions in a sample is different from each molecule. Then, it is assumed that a wettability is not always increased by the processing, because the modification by ion occurs at different depth depending on mass of molecules. To make clear a difference of modification depth on PTFE, the processing was carried out using noble gases and the depth profile by the XPS analysis using the TOA (Take-Off-Angle) resolution was obtained. A result showed that the modified layer is relatively uniform using He gas and its density is lower than another noble gas.