1 /spl mu/m-scale oxide/semiconductor photonic lattice fabrication by wet oxidation methods

We have shown that "all-solid" 1D and 2D oxide/semiconductor grating microstructures, with feature size of 1 /spl mu/m and 1:1 height:width aspect ratio, may be formed in a controlled manner by top-down pattern-masked wet-thermal oxidation of compositionally-graded AlGaAs layers. This approach is expected to have considerable impact in the fabrication of practical photonic lattice light-emitting devices.