Synchronous control technology of nano-stage in lithographic equipment using for LED manufacturing

A novel nano-stages system included wafer stage and reticle stage used for LED photolithography equipment with 0.8 micro technology node (half pitch) was proposed. A method of standstill dynamic error of synchronization control (SDSC) minimized the relative difference between motions of two stages. In order to improving the synchronization control error of two stages, reticle stage servo stiffness compensated against the synchronization error and wafer stage acceleration error fed forward on the reticle stage were described in the method. Through modeling and simulation, an optimization results were carried out to verify that SDSC method effectively minimized the relative location error. Finally, the advantages of the method were proved by prototype test data as a conclusion.