A 55 nm triple gate oxide 9 metal layers SiGe BiCMOS technology featuring 320 GHz fT / 370 GHz fMAX HBT and high-Q millimeter-wave passives

This paper presents the first 55 nm SiGe BiCMOS technology developed on a 300 mm wafer line in STMicroelectronics. The technology features Low Power (LP) and General Purpose (GP) CMOS devices and 0.45 μm
²
6T-SRAM bit cell. High Speed (HS) HBT exhibits 320 GHz f
_T
and 370 GHz f
_MAX
associated with a CML ring oscillator gate delay τ
_D
of 2.34 ps. Transmission lines, capacitors, high-Q varactors and inductors dedicated to millimeter-wave applications are also available.