Development of microstrip chebyshev low pass filters using laser micromachining

This paper describes the development of the 5th order Chebyshev microstrip low pass filter using both Advanced Design Software (ADS) simulation and laser micromachining fabrication technique. The significance of this work is the introduction of a new concept used to fabricate low-pass filter which is using laser micromachine. At present, laser micromachine is used to complement conventional photolithography process in the production of MEMS devices. The use of laser micromachining can lead to finer finishes, improved accuracy and less process overhead. The fabrication is implemented using silicon substrate, as opposed to the commonly used FR4 substrate. The simulation and measurement results of microstrip low pass filter fabricated using the micromachine have been compared and excellent agreement is observed. The rejection performance of the filter is improved when the gain is approximately 40dB. The return loss matching response is observed to be near to −20dB. The fabricated circuit cut-off frequency is closer to the simulated design frequency of 2.5GHz.