Nano-scale tip fabricated by electro-chemical machining for nano lithography

Tip-based nanolithography provides a flexible nano-lithographic technology. The tip fabrication is the main challenge of the technology. In this paper, we propose to combine the dry etching of photoresist and electro-chemical machining to reduce the size of the tip opening. We successfully fabricate a tip opening with the dimension of 220 nm. After lithography and lift-off, the gold dot patterns with a diameter of 200 nm are demonstrated.