Multi-electron-beam nanoelectronics

For high throughput electron microscopy and lithography, the only option is to use multi-electron beam systems. For microscopy, a significant advance can be made with a system of about 100 beams in parallel. For lithography to be used as a direct write method of integrated circuits, hundreds of thousands of beams are necessary. For focusing, deflection and blanking of the beams, special vacuum nanoelectronics has been developed. The ultimate example is a beam blanker that can switch 129.948 beams at 70 Mbps per beam.