Pattern stretchable micro-nano thin film via Electrohydrodynamic Direct-Writing

Mechanical stretching force is introduced into the Electrohydrodynamic Direct-Write (EDW) process. The effects of mechanical stretching on the rheology and deposition behaviors of EDW jet were investigated. The stretching affects that stemmed from the EDW motion platform provided an extra force on the charged jet. The larger stretching force applied on the jet played a good role to overcome bending instability, and stretch the jet into finer ones. Since the short distance between spinneret and collector, the mechanical stretching force acted more important role on the jet formation process. Thanks to the stretching effect, the whipping of charged jet can be avoided and micro/nano thin film without curve structure can be direct-written on the collector. With increasing collector motion velocity, the line width and thickness of micro/nano thin film will be decreased. During the EDW process, the mechanical stretching force had provided an excellent aspect to control the morphology and deposition pattern of EDWed micro/nano thin film.