Single layer graphene nano-patterning based on local anodic lithography in ambient conditions

In this paper, a systematic study of single layer graphene nano-patterning based on local anodic oxidation (LAO) lithography has been carried out using the atomic force microscope (AFM). Process parameters such as tip scan rate, applied tip bias voltage and their relationship to pattern sizes for local oxidation of graphene sheet were observed and optimized. Graphene oxide with minimum width of 49 nm was realized using the LAO technique in ambient condition. The results indicate that higher scanning rate and lower bias voltage are desired to increase the resolution of nano-patterns, which is significantly important for fabricating graphene-based nanoscale electric devices.