Intrinsic Time Zero Dielectric Breakdown Characteristics of HfAlO Alloys

A thermochemical model describing the relationship between the dielectric breakdown field (EBD) and dielectric constant (k) of high- k dielectric has been calibrated for Hf
_x
Al
_1-x
O
_y
alloys with k values from 7 to 24. Metal-insulator-metal (MIM) capacitors with Hf
_x
Al
_1-x
O
_y
high- k dielectric films were used to extract the intrinsic time zero dielectric breakdown characteristics. Breakdown field values of these Hf
_x
Al
_1-x
O
_y
alloys were found to decrease as a function of k
^-0.77
while the electric field acceleration parameter, γ, increases as a function of k
^1.37
. Using the thermochemical model calibrated with the experimental data, a Hf
_x
Al
_1-x
O
_y
10-year lifetime was extrapolated as a function of the dielectric constant to provide insight for future dielectric development.