Performance degradation simulation for M-type cathode based on ion bombardment

Simulation of M-type cathode performance degradation is studied based on ion bombardment with interdiffusion effect considered. Sputtered volume, sputter distribution and ion spot occurrence time can be estimated, with estimated sputtered volume close to former researches. For M-type Re-coated cathode with 300nm-thick film, ion spots were estimated to appear after 2.06×10⁵h's working.