Open fault detection method for CMOS-LSI by supplying pulsed voltage signal to VDD and GND lines

An easy and rapid failure analysis method to detect CMOS-LSI open faults has been developed. This method exploits both the properties of CMOS structure and the voltage contrast image. By supplying pulsed signal to VDD and GND, and observing the voltage contrast image, open faults appear different from the rest of the LSI. An image processing system is proposed which improves image observability and thereby decreases inspection time.