Low-cost fabrication of millimeter-wave all-silicon high efficiency antenna

A fabrication process of high-efficiency low-cost all silicon antenna at the millimeter wave range of frequency is presented. The antenna fabrication is a multi-level deep reactive ion etching process of a high resistivity intrinsic silicon wafer. The new process provides a silicon-platform for integrated planar antenna. A fabricated antenna with two level of Si was tested at 77GHz with an efficiency of 91% using the proposed fabrication process.