Structure change and field emission of carbon nanotubes treated by plasma

We study the field emission properties of multiwalled carbon nanotubes (MWCNTs) grown by thermal chemical vapor deposition (TCVD) on silicon substrate before and after plasma treatment. Ar and O2 gas plasma were used, which was compared with non-treated MWCNTs. The O2 plasma treated MWCNTs exhibited the most excellent electron emission among two plasmas treatment. In addition, uniformity of electron emission for O2 plasma treatment was good and turn-on field was decreased. Thus, plasma treated CNT was considered as using field emitter.