Characterization of the gliding arc device for industry applications

From the last decade of the 20th century a new type of atmospheric pressure plasma source has been developed. It is non thermal plasma source based on the principles of gliding arc. It is very important to know basic characteristics of the device to be used for many different applications. The main parameter that can limit device utilization is temperature distribution in carrier gas flow depending on treated substrate position. The temperature distribution measurements for various distances and gas flows are presented in the paper. Determination of the optimum parameters of the device for the highest process efficiency achievement was performed by water contact angle measurement on the treated polyethylene surface. The gliding arc plasma influence on the pH of water was established as well because of the potential device usage in advance oxidation processes.