Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability towards alkali or acid, the FC film was used for circuit area protection of an integrated accelerometer during silicon alkaline etching process by 25wt% TMAH at 90/spl deg/C. Moreover, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C/sub 7/F/sub 16/,C/sub 8/F/sub 18/, etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.