Texture change of NiSi film with dopant implantation

We investigated the texture of NiSi films on Si substrates with various implanted species. Detailed analysis using pole figure measurements shows that implantation of boron on substrate changes the texture of NiSi films drastically, from axiotaxy to transrotational structure, when the dose of boron is more than 5e15 atoms/cm². We predict that this transition of crystallographic orientation is driven by the total energy minimization, which consists of interfacial energy of films and/or elastic energy of NiSi lattice.