Deposition of Ti/C nano-composite thin films by magnetron DC sputtering using dual targets

Deposition of Ti/C nanocomposite thin films by magnetron DC sputtering was examined using dual targets of titanium and carbon, in order to investigate the effects of the distribution of titanium atoms and carbon atoms in the films on their surface morphology and their mechanical properties or physical properties. The Ti/C nano-composite thin films were deposited on glass substrates in the atmosphere of argon at the pressure of 0.4Pa by co-sputtering of both a titanium target and a carbon one.