P1–6: Compensation of divergence of space charge dominated ion beams using electron injection and confinement in non-uniform magnetic fields

Advanced ion implantation systems require transportation to wafer of space charge dominated ion beams. Compensation of ion beam divergence may be obtained through electron injection and confinement in regions of non-uniform magnetic fields. Electron sources of choice are field emitter arrays with special properties. Modeling results are presented as proof of concept, together with design aspects for practical optimization.