Towards a 40 Gb/s electrical time division multiplexed optical transmission system

The future demand for extremely high data rate systems will be governed by the need to accommodate increasing traffic. The goal of our current project is a demonstrator for a 40 Gb/s TDM optical transmission system in 1998, whose electrical components are based on a Si and SiGe bipolar laboratory technologies using 0.6 /spl mu/m lithography.