Magnetoresistance effect and magnetic properties of strain induced Co/Cu multilayer films

We have produced Co(tCo)/Cu multilayer and alloy films on a polyimide substrate (1 cm²) with layers grown in the atomic scale using a pulse generator circuit. The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.0 nm/Cu 1.5 nm]₅₀ showed a minimum hysteresis loss. The maximum magnetoresistance (MR) ratio observed was 3.4% at 1 kOe. A remarkable difference of the magnetic field dependence of the MR ratio was observed corresponding to the orientation of the magnetization curves.