Fabrication and characterization of Co(11~00)/Mo(211) and Co(112~0)/Mo(100) bilayered films on MgO

Co/Mo bilayered films have been successfully grown on MgO(100) and MgO(110) substrates by molecular beam epitaxy. According to the reflection high energy electron diffraction and X-ray diffraction measurements the crystal structure of the film depends on the orientation of the buffer and substrate. The growth of biaxial Co(112~0)/Mo(100) on MgO(100) and of uniaxial Co(11~00)/Mo(211) on MgO(110) substrates has been confirmed. The anisotropic magnetoresistance (AMR) is strongly influenced by the Co orientation which is altered by growth on Mo/MgO(100) and MgO(110). In Co(112~0)/Mo(100) on MgO(110) AMR is isotropic for all in-plane fields. However, for Co(11~00)/Mo(211) on MgO(110) we observed enhancement of AMR along the easy axis at 10 K.