Sub-nm order fluctuation control of narrowed pitch 2K-GxL™ device for high contrast

We developed a novel 2K vertical resolution device, the 2K-GxL device, for a super real projector, which enabled ribbon pitch to be miniaturized and the contrast ratio to be high simultaneously. Shrinking the ribbon pitch from 4.25 µm from that of previous 1K-GxL device to 3.00 µm was done by introducing a tapered structure to the step region. A high device contrast ratio of 77000 was achieved by suppressing the fluctuation of ribbon height to under 0.32 nm by using the KrF lithography, and also developing a super flattened mirror.