High vertical resolution 3D Nanoimprint technology for nanophotonic applications

High vertical resolution 3D Nanoimprint technology for nanophotonic applications is presented. Opaque and transparent 3D templates with 64 different heights are fabricated. Surface roughness and structure height accuracy better than 1 nm are achieved. The conservation of these critical parameters during the 3D Nanoimprint process is proved. A Fabry-Peacuterot filter array is shown as a possible application with a filter transmittance of up to 90% and a linewidth (FWHM) of less than 3 nm.