The control of ferroelectric film texture upon rf sputtering

Polycrystalline Pb(Zr/sub 0.53/Ti/sub 0.45/W/sub 0.01/Cd/sub 0.01/)O/sub 3/ films on the stainless steel substrates were fabricated by rf sputtering of stoichiometric ceramic targets in an O/sub 2/ atmosphere. The effect of potential U/sub b/ biasing the substrate with respect to the high-frequency discharge plasma on film microstructure was studied. It was established that the main effect is the formation of the (001) texture at U/sub b/<-20 V on nonorienting substrates. The origin of this effect is discussed.