Field emitter array patterning for large scale flat panel displays using laser interference lithography

Summary form only given. We present our research on interference lithography for field emission flat panel display applications. We report on a laser interference lithography technique that is capable of exposing very high density (/spl ges/10/sup 9/ dots/cm/sup 2/) sub-quarter micron patterns over very large fields (/spl ges/10/sup 4/) with excellent uniformity.