The Impact of Technology Node Scaling on nMOS SPDT RF Switches

This work presents a comparison of three single-pole double-throw (SPDT) nMOS RF switches implemented in commercially available Si-based 180, 130, and 90 nm technologies. In addition, a new series-shunt switch is presented that offers a means to improve switch isolation. Measured results of these RF switches demonstrates how technology node scaling impacts RF switch design and provides insight into the complicated trade-offs between insertion loss, isolation, and linearity.