ZnO thin film grown on glass by metal-organic chemical vapor deposition

ZnO thin film was deposited on the substrate of Corning glass by metal-organic chemical vapor deposition (MOCVD) [X. Wang et al., 2002; J. Wang et al., 2002; X. Wang et al., 2001] with a buffer layer of SiN_x grown by plasma enhanced chemical vapor deposition. The quality of ZnO film was studied by X-ray diffraction and photoluminescence measurement. We found strong diffraction (0 0 2) peak at 34.50deg, indicating that the ZnO film was strongly C-oriented. The full-width at half maximum of (0 0 2) peak was 0.179deg.