A novel vinyl ether resin of poly(4-vinylphenol) derivative for lithographic resist

Vinyl ether (VE) resins are considered as high reactive monomers which undergo a fast cationic polymerization in the presence of photogenerated protonic acids, so VE-based resins appear to be an attractive alternative to the widely used acrylate resins in UV-curing. To examine the VE resin properties, it is utilized as negative photoresist.