Magnetic Characteristics of CoCr Thin Films on Metallic Under Layer

A dc magnetron sputtering device was used to fabricate under layer films of NiFe, Ti, Mo, Ta, and CoZrNb with thicknesses of 0.03-0.3, μm and then CoCr films on top with a thickness of 0.2, μm under fixed conditions. Comparing VSM and Kerr effect analysis results for these films with similar analyses of CoCr films on PET films, the Hc⊥ value was large but the perpendicular anisotropy was small. This is due to the fact that in the columnar structure small grains grow with non-uniform directions disturbing the structure.