Improving characteristics of dielectric materials used for electronic devices

Dielectric materials are considered an important key in modern electronic and communication systems. A useful study of a.c conduction mechanism for one of dielectric materials, which is called polysiloxane, is considered in this work. Dielectric characteristics of a thin film layer deposited by glow discharge technique under the effect of different electrical parameters variation are investigated. The conduction mechanism and electrical properties of the deposited film layers are investigated under the effect of variation of frequency, electric field intensity, operating temperature and moisture contents.