Effect of UV Irradiation on Organic-SOG Patterns Replicated by Room-Temperature Nanoimprinting

Organic spin on glass(O-SOG) is very useful owing its unique property of enabling imprinting at room temperature as well as hydrogen silsesquioxane that we have used. This means that nanoimprinting using O-SOG as the replication material completely eliminates resist-thermal cycle and UV exposure. To avoid the pattern deformation, in this paper we investigate an effect of UV irradiation on the O-SOG-imprinted patterns before annealing.