Micromachined inset-fed patch antenna at Ka-band

In this paper, we report the design and fabrication of high performance Ka-band inset- fed micromachined patch antenna using post- CMOS compatible process technology. The main emphasis of this paper is to demonstrate use of RF sputtering as potential metal-dielectric films deposition-process for rapid prototyping of many antenna structures in the absence of access to a well- established MEMS foundry. The fabricated antenna resonated at 35 GHz with 3.14% impedance bandwidth.