Fabrication of X-ray Mask using Poly-Si Microstructure for Diffraction Grating

There is an X-ray Talbot interferometer in one of the imaging technology by X-ray phase information. A diffraction grating is necessary for a Talbot interferometer, but the manufacture is difficult. In this study, we decided to make a diffraction grating to use it for a Talbot interferometer in X-ray lithography. For the development of a fine and high-precision X-ray mask, a rectangular structure of a high aspect ratio was formed through conventional UV lithography incorporating an ICP-based Si dry etching process that enables fine patterning. We succeeded in making 2.2 μm in width, a Poly-Si structure body of 4.7 μm high. We succeeded in forming 2.6 μm in width, a gold absorber of 4.2 μm high by Au electrolysis plating. We succeeded in making 2.2 μm in width, a SU-8 structure body of 10 μm high by X-ray lithography. Conventionally, we were able to complete a fine X-ray mask.