Investigations On The High-Temperature Performance Of Sputter-Deposited Aluminium Oxide Thin Films

Aluminum oxide thin films are deposited by reactive DC magnetron sputtering onto silicon substrates. In post deposition annealing steps the films are heat treated up to 1000degC. The films are analyzed applying electrical and micro-structural characterization to achieve a comprehensive understanding on film properties. Their potential as insulating films in high temperature sensor applications is evaluated.