Tensile Testing of Single Crystal Silicon Thin Films at 800°C using IR Heating

This paper reports on the development of a new tensile tester operable at 800°C using IR heating system for evaluating mechanical properties of thin films at high temperature. Single crystal silicon films of 3 μm thick were tested at 600°C. At room temperature, the fracture strength and Young's modulus were 3.33 GPa and 163.2 GPa, respectively. At 600°C, they were 2.71 GPa and 151.8 GPa, respectively. When the strain rate was decreased, the stress and stage displacement curves had yield points and the fractured specimens exhibited the slip lines at 600°C.