Simple Technique for Direct Patterning of Nanowires using a Nanoslit Shadow-Mask

Nanowires of various lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 μm have been realized. Measurements of electrical I-V characteristics show linear behavior of nanowires with widths and thickness each around 50nm.