Measurement of Inductive Coupling Effect on Timing in 90nm Global Interconnects

Inductive coupling is becoming a design concern for global interconnects in nano-meter technology. This paper shows measurement results of inductive coupling effect on timing, and reveals that inductive coupling noise is a practical design issue in 90nm technology. The measured delay change curve is consistent with circuit simulation results with RLC interconnect model, and definitely different from those of conventional RC model. Long-range effect and noise reduction by ground insertion are clearly observed on silicon