An improved MMIC design system composed of an electron beam direct drawing, microwave simulation and on-wafer measurement subsystems

An improved design system is introduced to develop not only new monolithic microwave ICs (MMICs) and their element devices, but also their accurate simulation models. It is composed of electron beam (EB) direct drawing, microwave simulation, and on-wafer measurement subsystems connected through the LAN. Successful preliminary applications of this system are demonstrated for improved T-shaped 0.1 mu m length gate formation and an amplifier designed using this improved simulation model. The system and its advantages are described.<>