Direct inscription of calculated holograms with submicrometric resolution

We demonstrate a calculated hologram engraved at a submicrometric resolution using an original electron beam lithography process. The RBnano process is a simple and low cost alternative to classical microlithography techniques. It relies on the degradation of dried layers of liquid precursors by a focused electron beam. After the washing of the substrate, the path of the electron beam appears as a positive relief. Therefore, one can directly inscribe nanometric scale objects with a spatial resolution theoretically limited by the electron beam size. This process is applied to the direct inscription of a very high resolution calculated holograms. The calculated hologram is computed from an arbitrary source image using an iterative Fourier transform algorithm. The hologram is constituted of 1024*1024 pixel array for a 1*1 mm surface. The hologram reading using a He-Ne laser beam at 633 nm leads to the efficient reconstruction of the image at short distance (20 cm) with a S/N=10