Static friction in polysilicon surface micromachines

Surface micromachines of polycrystalline silicon were used to investigate the dependence of static friction in microelectromechanical systems on the external load, apparent contact area, and environmental conditions. An analytical model of the micromachine at the inception of sliding was used to determine the normal load consisting of the restoring and levitation forces exerted by the micromachine's comb-drive actuators. The apparent shear strength at the contact interface(s) exhibited a nonlinear dependence on the apparent contact pressure. Relatively higher static coefficient of friction and interfacial shear strength were obtained in room air than vacuum ambient. The static coefficient of friction was found to depend on the normal load, apparent contact area, and ambient conditions (i.e., relative humidity). Electrical contact resistance measurements indicated that sliding in room air promoted thickening of the native oxide film at asperity contacts. The experimental evidence suggests that modification of the surface topography occurred at the asperity level. However, these submicroscopic changes in the surface topography did not affect the overall static friction behavior, for the test cycles simulated in the friction experiments.