Deposition of Gd/sub 2/O/sub 3/ buffer layers on Ni-based substrates by aerosol spray pyrolysis

Aerosol spray pyrolysis (ASP) was used to deposit Gd/sub 2/O/sub 3/ on pure Ni and Ni(5at%W). The H/sub 2/:H/sub 2/O ratio in the gas stream, consisting of forming gas + the aqueous nitrate mist, was adjusted to 0.75, which prevented the Ni(W) substrate from oxidizing. A dense, /spl sim/600 nm thick layer of Gd/sub 2/O/sub 3/ could be deposited on a textured Ni(5at%W) substrate at 900/spl deg/C in 20 min. The Gd/sub 2/O/sub 3/ was not textured and the surface was rough.