Design of folded monopole array antenna used for large area plasma production

In order to deposit a uniform film using plasma enhanced chemical vapor deposition (PECVD), it is required to design an RF discharge antenna to produce and control the plasma in a large area. In this paper, a 25-element array of folded monopole antennas is introduced to deposit a-Si film on a large area glass substrate of 1.6 m/spl times/1.2 m using a frequency of 85 MHz. In order to obtain a uniform deposition rate distribution, the feed-phases of the array have been controlled in both the experiment and FDTD analysis. Also, investigated is the correlation between the electromagnetic field distribution and the deposition rate distribution.