Realization and characterization of magnetic media deposited on side edge of patterned silicon dot arrays

Magnetic materials were deposited by sputtering onto patterned arrays of silicon dots. Structural characterizations (i.e. AFM and TEM observations) have been performed on (Co/Pt) multilayers deposited on line arrays. The MFM image reveals that only the side-walls of dots which are covered by pure cobalt and magnetic. Moreover, they present a bipolar or a single pole contrast which suggest that this technique could be used for the fabrication of high density storage media.